Methods of manufacturing large-area sputtering targets using interlocking joints
US9564299B2 · kind B2 · utility
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27Claims
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Key dates
| Filing date | Feb 12, 2016 |
| Grant date | Feb 7, 2017 |
| Priority date | — |
| Expiry date | Feb 12, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.