Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith
US9568824B2 · kind B2 · utility
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23Claims
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Key dates
| Filing date | Jul 28, 2011 |
| Grant date | Feb 14, 2017 |
| Priority date | — |
| Expiry date | Jul 28, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.