Exposure method and exposure device
US9568843B2 · kind B2 · utility
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3References
13Claims
0Family size
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Key dates
| Filing date | Jun 14, 2013 |
| Grant date | Feb 14, 2017 |
| Priority date | — |
| Expiry date | Jul 23, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2014
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the disclosure provide an exposure method and an exposure device. The exposure method comprises: placing at least two transparent substrates coated with photoresist under one mask, wherein all of the at least two substrates are in parallel with the mask; irradiating the mask vertically with parallel exposure light to respectively expose the photoresist on the at least two substrates along a propagation direction of the exposure light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.