Patent · US Active

Array substrate, manufacturing method thereof and display device

US9570473B2 · kind B2 · utility

8Cited by
0References
12Claims
0Family size

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Key dates

Filing dateMay 26, 2014
Grant dateFeb 14, 2017
Priority date
Expiry dateMay 26, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/133345
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An array substrate, a manufacturing method thereof and a display device are disclosed. The manufacturing method of an array substrate including: forming patterns including a thin film transistor, a gate wiring and a data wiring on the base substrate; the gate wiring and the data wiring are located in a PAD area; forming patterns of an insulating spacing layer, a first transparent electrode and a passivation layer, and forming a first via hole and a second via hole in areas corresponding to the gate wiring and the data wiring respectively to expose the gate wiring and the data wiring; a thickness of the insulating spacing layer in the PAD area on the array substrate is less than that of the insulating spacing layer in other areas. Therefore, the connection electrode can make better contact with the corresponding signal lines to avoid abnormal rubbing mura.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.