Method and apparatus of manufacturing silicon seed rods
US9573817B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Aug 28, 2014 |
| Grant date | Feb 21, 2017 |
| Priority date | — |
| Expiry date | Jun 12, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/035
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method and apparatus for manufacturing high-purity long silicon seed rods with controlled resistivity for Siemens and similar processes with using a film of silicon dioxide, wherein a film of silicon dioxide is formed on the seed rod in the course of a reaction between a silicon melt and oxygen. The rod is formed with a quartz die and cooled by direct immersion into a cooling fluid, such as de-ionized water and/or by cooling fluid vapor in the gas cooling zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.