Patent · US Active

Plasma generating device

US9576775B2 · kind B2 · utility

1Cited by

3References

18Claims

0Family size

Assignees

EPCOS AG · DE
reylon plasma GmbH · DE

Inventors

Stefan Nettesheim · Regensburg, DE
Georg Kuegerl · Eibiswald, AT
Markus Puff · Graz, AT

Key dates

Filing date	Nov 4, 2014
Grant date	Feb 21, 2017
Priority date	—
Expiry date	Nov 4, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH05H1/44
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a plasma generation device comprising a plurality of plasma modules for generating a plasma. Each plasma module has a module housing with at least one gas inlet for supplying a process gas. Furthermore, a discharge device for generating the plasma from the process gas and a plasma outlet are provided. The plasma generation device has at least two plasma modules for generating a plasma. Each plasma module has at least one gas outlet for some of the process gas, wherein the at least one gas outlet of at least one plasma module issues into a respective gas inlet of another plasma module.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.