Calibration feature masking in overlap regions to improve mark detectability
US9578295B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 2015 |
| Grant date | Feb 21, 2017 |
| Priority date | — |
| Expiry date | Dec 18, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2200/32
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of displaying an image using at least a first projector and a second projector includes projecting a calibration pattern using the first projector, the calibration pattern being embedded in a first portion of an image projected by the first projector. The method determines a contribution of the second projector to projecting a second portion of the image to an overlap area, the overlap area having a contribution from the first and second projectors, wherein the contribution is an intensity of a color channel. The determined contribution of the second projector to the overlap area is modified to allow the calibration pattern of the first projector to be detectable to a capture device, the modification having a pattern corresponding to the calibration pattern. The image is then displayed using the first projector and the modified contribution of the second projector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.