Extreme ultraviolet source with dual magnetic cusp particle catchers
US9578729B2 · kind B2 · utility
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20References
4Claims
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Key dates
| Filing date | Nov 17, 2015 |
| Grant date | Feb 21, 2017 |
| Priority date | — |
| Expiry date | Nov 17, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low-temperature plasma. The plasma is initially trapped in a mirror magnetic field configuration with a low magnetic field barrier to axial motion. Plasma overflows axially at each end of the mirror into magnetic cusps and is conducted by radial magnetic field lines to annular beam dumps disposed around the waist of each cusp.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.