Positive-type photosensitive siloxane composition
US9580567B2 · kind B2 · utility
2Cited by
3References
15Claims
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Key dates
| Filing date | Nov 14, 2013 |
| Grant date | Feb 28, 2017 |
| Priority date | — |
| Expiry date | Nov 14, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2383/06
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 Å/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.