Shadow mask tensioning method and apparatus
US9581917B2 · kind B2 · utility
3Cited by
13References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 24, 2015 |
| Grant date | Feb 28, 2017 |
| Priority date | — |
| Expiry date | Jun 24, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/53961
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a system and method of shadow mask tensioning, an object having second set of alignment features is positioned on a side of shadow mask having a first set of alignment features such that the object and the shadow mask can move independently of each other and the first and second sets of alignment features are not in final alignment. Tension is then applied to the shadow mask to bring the first set of alignment features into final alignment with the second set of alignment features. The alignment features of the shadow mask can include at least one deposition aperture of the shadow mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.