Electron beam exposure system and methods of performing exposing and patterning processes using the same
US9588415B2 · kind B2 · utility
0Cited by
9References
17Claims
0Family size
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Key dates
| Filing date | Jan 6, 2015 |
| Grant date | Mar 7, 2017 |
| Priority date | — |
| Expiry date | Mar 12, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure system includes a data processing part that forms an exposure layout and an exposure part that irradiates an electron beam at a photoresist layer according to the exposure layout. The data processing part generates a control parameter for driving the exposure part without a pattern position error and a beam drift error and to prevent a discrepancy between the exposure layout and a mask layout to be formed in the photoresist layer. A controlling part controls the exposure part according to the control parameter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.