Plasma cleaning for mass spectrometers
US9589775B2 · kind B2 · utility
2Cited by
3References
17Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 30, 2015 |
| Grant date | Mar 7, 2017 |
| Priority date | — |
| Expiry date | Jul 30, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.