Methods of preparing polysilazane resin with low halogen content
US9593210B1 · kind B1 · utility
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19References
22Claims
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Key dates
| Filing date | Apr 22, 2016 |
| Grant date | Mar 14, 2017 |
| Priority date | — |
| Expiry date | Apr 22, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/9661
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Methods of producing low-halogen-containing polysilazane resins, which are used to make silicon carbide fibers and ceramic coatings, provide processes for removing halogens, including chlorine, from precursor polysilazane resins.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.