Surfactants with lower CMC, and surfactant systems and detergents containing said surfactants

US9593295B2 · kind B2 · utility

Assignees

• Henkel AG & Co. KGaA & Studiengesellschaft · DE
• Kohle mbH · DE

Inventors

• Christian Kropf · Hilden, DE
• Nicole Bode · Goldkronach, DE
• Danuta Bedrunka · Dormagen, DE
• Roberto Rinaldi · Wetter (Ruhr), DE
• Hebert Jesus Estevez Rivera · Bochum, DE

Key dates

• Filing date: Jul 30, 2015
• Grant date: Mar 14, 2017
• Expiry date: Jul 30, 2035

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D1/72
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

The invention relates to surfactants of the formula (I), in which R1 stands for —H or —CH3; R2, R3, R4, R5, R6 independently stand for —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH(CH3)2, —CH2CH2CH2CH3, —CH2CH(CH3)2, —CH(CH3)CH2CH3, —C(CH3)3, —OH, —OCH3, —OCH2CH3, —OCH2CH2CH3, —OCH(CH3)2, a linear or branched alkyl group containing 8 to 20 C atoms, or —SO3−X+; X+ stands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R2, R3, R4, R5, R6 stands for —SO3−X+; and exactly one radical R2, R3, R4, R5, R6 stands for a linear or branched alkyl radical containing 8 to 20 C atoms.