Method of manufacturing mask
US9595674B2 · kind B2 · utility
1Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 2015 |
| Grant date | Mar 14, 2017 |
| Priority date | — |
| Expiry date | Sep 16, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing a mask includes aligning a mask substrate comprising a thin film at a processing position, forming a coating layer comprising a cleaning solution material on a first surface of the mask substrate, forming a deposition pattern on a second surface of the mask substrate, and removing the coating layer from the mask substrate comprising the deposition pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.