Patent · US Active

Polishing media, method for producing polishing media, and polishing method

US9597767B2 · kind B2 · utility

4Cited by
4References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 29, 2012
Grant dateMar 21, 2017
Priority date
Expiry dateMar 29, 2034

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB22F2998/10
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A polishing media is formed of a sintered body in which a metal structure and a ceramic structure are intermingled with each other. The polishing media is preferably produced by molding a mixed powder of a metal powder and a ceramic powder by an injection molding method and sintering the resulting molded article. Further, the ceramic structure is preferably formed of aluminum oxide, and the metal structure is preferably formed of tungsten.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.