Patent · US Active

Photosintering of micron-sized copper particles

US9598776B2 · kind B2 · utility

2Cited by
109References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 9, 2013
Grant dateMar 21, 2017
Priority date
Expiry dateNov 13, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/1545
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

Micron-sized metal particles in an ink or paste composition are deposited onto a substrate and then photosimered. The substrate may comprise a polymeric material. The polymeric substrate may have a coefficient of thermal expansion greater than two times the coefficient of thermal expansion of the photosimered ink or paste composition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.