Patent · US Active

Ambipolar vertical field effect transistor

US9601707B2 · kind B2 · utility

2Cited by
1References
25Claims
0Family size

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Key dates

Filing dateNov 26, 2013
Grant dateMar 21, 2017
Priority date
Expiry dateNov 26, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K85/221
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Various examples are provided for ambipolar vertical field effect transistors (VFETs). In one example, among others, an ambipolar VFET includes a gate layer; a source layer that is electrically percolating and perforated; a dielectric layer; a drain layer; and a semiconducting channel layer. The semiconducting channel layer is in contact with at least a portion of the source layer and at least a portion of the dielectric layer and the source layer and the semiconducting channel layer form a gate voltage tunable charge injection barrier. Another example includes an ambipolar vertical field effect transistor including a dielectric surface treatment layer. The semiconducting channel layer is in contact with at least a portion of the source layer and at least a portion of the dielectric surface treatment layer and where the source layer and the semiconducting channel layer form a gate voltage tunable charge injection barrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.