Quantitative analysis method for measuring target element in specimen using laser-induced plasma spectrum
US9606065B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2013 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Dec 12, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J3/443
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed herein is a quantitative analysis method for measuring a target element in a specimen using laser-induced plasma spectrum. More particularly, the present invention relates to a method for analyzing a composition ratio of a target element by calculating peak intensities when peaks overlap each other in a spectrum, and a method for selecting a peak of a wavelength at which the highest precision and reproducibility are secured through linearity of a correlation plot of the peak intensities and a value by dividing a standard deviation value of calibration curve data (peak intensity ratios) by a slope when an internal standard method is used for quantitative analysis of a target element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.