Substrate processing apparatus and substrate processing system
US9606454B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2013 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Apr 26, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70733
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport region and a plurality of vertical transport regions in a casing. The horizontal transport region is provided at the upper portion of the casing to extend in the X direction. A plurality of exposure devices are arranged below the horizontal transport region to be lined up in the X direction. A transport mechanism is provided in the horizontal transport region. The transport mechanism is configured to be capable of transporting a substrate between the processing section and the plurality of exposure devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.