Dual medium filter for ion and particle filtering during semiconductor processing
US9607864B2 · kind B2 · utility
2Cited by
11References
18Claims
0Family size
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Key dates
| Filing date | May 23, 2012 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Jan 22, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/0216
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.