Forming structures using aerosol jet® deposition
US9607889B2 · kind B2 · utility
1Cited by
228References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2014 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Aug 1, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N30/074
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.