Controlled fabrication of nanopores in nanometric solid state materials
US9611140B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2012 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Jun 16, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2207/056
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a method of forming a nanopore in a nanometric material, a nanopore nucleation site is formed at a location that is interior to lateral edges of the nanometric material by directing a first energetic beam, selected from the group of ion beam and neutral atom beam, at the interior location for a first time duration that imposes a first beam dose which causes removal of no more than five interior atoms from the interior location to produce at the interior location a nanopore nucleation site having a plurality of edge atoms. A nanopore is then formed at the nanopore nucleation site by directing a second energetic beam, selected from the group consisting of electron beam, ion beam, and neutral atom beam, at the nanopore nucleation site with a beam energy that removes edge atoms at the nanopore nucleation site but does not remove bulk atoms from the nanometric material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.