Patent · US Active

Electronic interconnects and devices with topological surface states and methods for fabricating same

US9613905B2 · kind B2 · utility

2Cited by
2References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 21, 2015
Grant dateApr 4, 2017
Priority date
Expiry dateOct 21, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49204
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An interconnect is disclosed with enhanced immunity of electrical conductivity to defects. The interconnect includes a material with charge carriers having topological surface states. Also disclosed is a method for fabricating such interconnects. Also disclosed is an integrated circuit including such interconnects. Also disclosed is a gated electronic device including a material with charge carriers having topological surface states.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.