Method for forming thin film and method for fabricating organic light-emitting diode (OLED) display using the same
US9614192B2 · kind B2 · utility
1Cited by
6References
29Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 16, 2014 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Apr 21, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/173
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for forming a thin film for fabricating an organic light-emitting diode (OLED) display is disclosed. In one aspect, the method includes forming a plurality of shadow masks on a substrate. The substrate is then bent to form a predetermined curvature in the substrate. A deposition source is placed at a position having an equal angle with respect to central and peripheral portions of the substrate. The method also includes depositing a deposition material from the deposition source on the substrate and the shadow masks to form a thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.