System and method for inhibiting radiative emission of a laser-sustained plasma source
US9615439B2 · kind B2 · utility
5Cited by
4References
31Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 6, 2016 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Jan 6, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/16
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element. The gas containment element is configured to contain a volume of a gas mixture. The collector element is configured to focus the pump illumination from the pumping source into the volume of the gas mixture contained within the gas containment element in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas mixture filters one or more selected wavelengths of radiation emitted by the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.