Patent · US Active

Method for producing alkyl-indium compounds and the use thereof

US9617284B2 · kind B2 · utility

3Cited by
4References
68Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 18, 2014
Grant dateApr 11, 2017
Priority date
Expiry dateAug 18, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07F5/00
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The invention relates to a method for the cost-effective and environmentally friendly production of alkyl indium sesquichloride in high yield and with high selectivity and purity. The alkyl indium sesquichloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapor deposition (MOCVD) or metal organic vapor phase epitaxy (MOVPE). The novel method according to the invention is characterized by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.