Patent · US Active

Halogenated polysilane and thermal process for producing the same

US9617391B2 · kind B2 · utility

1Cited by
5References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 27, 2009
Grant dateApr 11, 2017
Priority date
Expiry dateAug 28, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G77/60
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The present invention relates to a halogenated polysilane as a pure compound or mixture of compounds each having at least one direct Si—Si bond, whose substituents consist exclusively of halogen or of halogen and hydrogen and in whose composition the atomic ratio substituent:silicon is greater than 1:1.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.