Electrostatic multipole device, electrostatic multipole arrangement, charged particle beam device, and method of operating an electrostatic multipole device
US9620328B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 20, 2015 |
| Grant date | Apr 11, 2017 |
| Priority date | — |
| Expiry date | Nov 20, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1534
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multipole device for influencing a charged particle beam propagating along an optical axis is described. The multipole device includes: an electrostatic deflector with at least two deflector electrodes for deflecting the charged particle beam by a deflection angle, wherein the deflector electrodes extend over a first length along the optical axis; and an electrostatic corrector comprising at least four corrector electrodes to compensate for an aberration of the charged particle beam, wherein the corrector electrodes extend over a second length along the optical axis, which is shorter than the first length. A distance between a projection of the deflector electrodes on the optical axis and a projection of the corrector electrodes on the optical axis may be smaller than the first length so that, during operation of the multipole device, first fringe fields generated by the deflector electrodes and second fringe fields generated by the corrector electrodes may spatially overlap, wherein the electrostatic corrector may be configured to compensate for an aberration of the charged particle beam caused by the electrostatic deflector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.