Patent · US Active

Electrostatic multipole device, electrostatic multipole arrangement, charged particle beam device, and method of manufacturing an electrostatic multipole device

US9620329B1 · kind B1 · utility

4Cited by

3References

20Claims

0Family size

Assignee

ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · DE

Inventors

Benjamin John Cook · Munich, DE
Dieter Winkler · Munich, DE

Key dates

Filing date	Nov 20, 2015
Grant date	Apr 11, 2017
Priority date	—
Expiry date	Nov 20, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/1534
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The multipole device includes a first electrical contact, a second electrical contact, and a high-resistance layer which extends at least partially around the optical axis and is configured to allow a current flow between the first electrical contact and the second electrical contact, wherein the first electrical contact contacts the high-resistance layer at a first circumferential position and is configured to provide a first potential to the first circumferential position, and wherein the second electrical contact contacts the high-resistance layer at a second circumferential position at an angular distance from the first circumferential position and is configured to provide a second potential to the second circumferential position. Further, an electrostatic multipole arrangement including two or more such multipole devices and a charged particle beam device are described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.