Production method

US9620375B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Sergiu LANGA · Dresden, DE
• Christian Drabe · Dresden, DE
• Thilo Sandner · Dresden, DE

Key dates

• Filing date: Mar 26, 2015
• Grant date: Apr 11, 2017
• Expiry date: Jun 8, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B26/0833
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A production methods includes providing a substrate including a lattice plane that extends in a non-symmetrical manner and such that it is offset at an angle α from at least a first or second main surface region of the substrate, the first and second main surface regions extending parallel to each other; anisotropic etching, starting from the first main surface region, into the substrate so as to obtain an etching structure which includes, in a plane extending perpendicularly to the first main surface region, two different etching angles relative to the first main surface region; arranging a cover layer on the first main surface region, so that the cover layer lies against the etching structure in at least some sections; and removing, section-by-section, the material of the substrate starting from the second main surface region in the area of the deformed cover layer, so that the cover layer is exposed in at least one window region.