Patent · US Active

Apparatus for generating plasma

US9627167B2 · kind B2 · utility

1Cited by
2References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 25, 2015
Grant dateApr 18, 2017
Priority date
Expiry dateFeb 25, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/36
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Provided herein an apparatus for generating plasma, the apparatus including a nozzle array, first electrode, and housing. The nozzle discharges plasma. The first electrode is disposed to surround the nozzle array. The housing is disposed to surround the nozzle array and first electrode. The nozzle includes a plurality of nozzles disposed adjacent to one another and in the form of an array, each nozzle configured to discharge plasma. Therefore, it is possible to generate a large size plasma evenly and stably.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.