Methods of fabricating micro- and nanostructure arrays and structures formed therefrom

US9627199B2 · kind B2 · utility

Assignees

• UNIVERSITY OF MARYLAND, COLLEGE PARK · US
• NORTHROP GRUMMAN SYSTEMS CORPORATION · US
• The United States of America, as Represented by the Secretary of Commerce National Institute of Standards and Technology · US

Inventors

• Abhishek Motayed · Rockville, US
• Sergiy Krylyuk · Montgomery Village, US
• Albert V. Davydov · North Potomac, US
• Matthew Russell King · Wake Forest, US
• Jong-Yoon Ha · Seongnam-si, KR

Key dates

• Filing date: Dec 12, 2014
• Grant date: Apr 18, 2017
• Expiry date: Dec 12, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10H20/825
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Methods of fabricating micro- and nanostructures comprise top-down etching of lithographically patterned GaN layer to form an array of micro- or nanopillar structures, followed by selective growth of GaN shells over the pillar structures via selective epitaxy. Also provided are methods of forming micro- and nanodisk structures and microstructures formed from thereby.