Fabrication of correlated electron material devices
US9627615B1 · kind B1 · utility
61Cited by
4References
23Claims
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Key dates
| Filing date | Jan 26, 2016 |
| Grant date | Apr 18, 2017 |
| Priority date | — |
| Expiry date | Jan 26, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C2013/0078
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform a switching function. In embodiments, precursors, in a gaseous form, may be utilized in a chamber to build a film of correlated electron materials comprising various impedance characteristics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.