Systems and methods for seamless patch matching
US9633460B2 · kind B2 · utility
0Cited by
7References
19Claims
0Family size
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Key dates
| Filing date | Dec 23, 2013 |
| Grant date | Apr 25, 2017 |
| Priority date | — |
| Expiry date | Jun 2, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20221
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method implemented in an image editing device comprises determining a source region in a source image and determining a target region in a target image. At least one image characteristic of each of the source region and a region outside the target region is analyzed. The content in the source region is adjusted according to the at least one image characteristic of the source region and the at least one image characteristic of the region outside the target region. The adjusted content from the source region is inserted into the target region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.