Plasma emission monitor and process gas delivery system
US9633823B2 · kind B2 · utility
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2References
20Claims
0Family size
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Key dates
| Filing date | Mar 14, 2013 |
| Grant date | Apr 25, 2017 |
| Priority date | — |
| Expiry date | Mar 30, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas manifold for delivery gas to a sputtering chamber is provided with ports to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.