Selective removal of a coating from a metal layer, and solar cell applications thereof
US9634179B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2013 |
| Grant date | Apr 25, 2017 |
| Priority date | — |
| Expiry date | Jun 12, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/547
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method and resulting structure of patterning a metal film pattern over a substrate, including forming a metal film pattern over the substrate; depositing a coating over the substrate surface and the metal film pattern; and removing the coating over the metal film pattern by laser irradiation. The substrate and coating do not significantly interact with the laser irradiation, and the laser irradiation interacts with the metal film pattern and the coating, resulting in the removal of the coating over the metal film pattern. The invention offers a technique for the formation of a metal pattern surrounded by a dielectric coating for solar cells, where the dielectric coating may function as an antireflection coating on the front surface, internal reflector on the rear surface, and may further may function as a dielectric barrier for subsequent electroplating of metal patterns on either surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.