Patent · US Active

Oxide shell formation on inorganic substrate via oxidative polyoxoanion salt deposition

US9634321B2 · kind B2 · utility

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18Claims
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Key dates

Filing dateMar 12, 2013
Grant dateApr 25, 2017
Priority date
Expiry dateMar 12, 2033

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/10
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The present invention provides a process for depositing an oxide coating on an inorganic substrate, including providing an aqueous composition containing a tetraalkylammonium polyoxoanion and hydrogen peroxide; contacting the aqueous composition with an inorganic substrate for a time sufficient to deposit a hydroxide derived from the polyoxoanion on surfaces of the inorganic substrate to form an initially coated inorganic substrate; and heating the initially coated inorganic substrate for a time sufficient to convert the hydroxide to an oxide to form on the inorganic substrate an oxide coating derived from the polyoxoanion. The inorganic substrate may be a ceramic material or a semiconductor material, a glass or other dielectric material, and the ceramic material may be a lithium ion battery cathode material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.