Patent · US Active

Patterned phase difference film and method for manufacturing same

US9638848B2 · kind B2 · utility

0Cited by
1References
8Claims
0Family size

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Key dates

Filing dateOct 1, 2012
Grant dateMay 2, 2017
Priority date
Expiry dateSep 30, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/133633
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A pattern phase difference film is manufactured by a process including a laminate body formation step of applying a pattern alignment layer composition on a substrate to form a laminate body, a heat-drying layer formation step of heat-drying the composition to form a heat-dried layer, a pattern alignment layer formation step of irradiating a polarization pattern onto the heat-dried layer to form a pattern alignment layer, and a phase difference layer formation step of forming a phase difference layer including a rod-shaped compound on the pattern alignment layer. During the steps between the heat-drying layer formation step and the phase difference layer formation step, the heat-dried layer and the pattern alignment layer are exposed to the air for four hours or less.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.