Method and system for optical proximity correction (OPC)
US9638994B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2015 |
| Grant date | May 2, 2017 |
| Priority date | — |
| Expiry date | Sep 15, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An Optical Proximity Correction (OPC) method is provided for compensating the Optical Proximity Effect (OPE) influence. The method include providing a substrate having at least one semiconductor structure and with a plurality of regions, providing a target pattern to be formed on the substrate, and respectively obtaining aerial image light intensity functions of the plurality of regions of the substrate. The method also includes establishing an OPC model based on the aerial image light intensity functions of the plurality of regions, and performing an OPC process to the target pattern by using the OPC model to adjust the target pattern factoring in optical effect of the plurality of regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.