Patent · US Active

Nano-patterned system and magnetic-field applying device thereof

US9640363B2 · kind B2 · utility

0Cited by
3References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 30, 2016
Grant dateMay 2, 2017
Priority date
Expiry dateSep 30, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31754
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A nano-patterned system comprises a vacuum chamber, a sample stage and a magnetic-field applying device, which comprises a power supply, a magnetic-field generation device and a pair of magnetic poles. The magnetic-field generation device comprises a coil and a magnetic conductive soft iron core. The power supply is connected to the coil, which is wound on the soft iron core to generate a magnetic field. The soft iron core is of a semi-closed frame structure and the magnetic poles are at the ends of the frame structure. The stage is inside a vacuum chamber. The poles are oppositely arranged inside the vacuum chamber relative to the stage. The coil and the soft iron core are outside the vacuum chamber. The soft iron core leads the magnetic field generated by the coil into the vacuum chamber. The magnetic poles locate a sample on the stage and apply a local magnetic field.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.