EUV radiation generating device including a beam influencing optical unit

US9642235B2 · kind B2 · utility

Assignee

• TRUMPF Lasersystems for Semiconductor Manufacturing GmbH · DE

Inventors

• Joachim Schulz · Stuttgart, DE
• Martin Lambert · Buckingham, GB

Key dates

• Filing date: Dec 28, 2015
• Grant date: May 2, 2017
• Expiry date: Dec 28, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01S3/005
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An extreme ultraviolet radiation generating device includes a source operable to generate a first and second entrance beam, and a beam unit operable to modify at least one of a direction and a beam divergence of the first and second entrance beam, in which the beam unit includes: a beam splitter to receive the first and second entrance beam, the beam splitter being configured to reflect the first entrance beam as a first exit beam and to transmit the second entrance beam; and a mirror in the beam path of the transmitted, second entrance beam to reflect the second entrance beam to form a second exit beam that is transmitted by the beam splitter and that is at least partially superposed on the first exit beam, in which the beam unit is configured to modify an angle and/or beam divergence between the first and second exit beam.