Method and apparatus for restoring properties of graphene
US9643850B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Apr 17, 2013 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | Jun 26, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/845
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for restoring properties of graphene includes exposing the graphene to plasma having a density in a range from about 0.3*108 cm−3 to about 30*108 cm−3 when the graphene is in a ground state. The method and apparatus may be used for large-area, low-temperature, high-speed, eco-friendly, and silicon treatment of graphene.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.