Process-based approach for the detection of deep gas invading the surface
US9645129B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2014 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | Oct 20, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/24
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention includes a method for determining the level of deep gas in a near surface formation that includes: measuring CO2, O2, CH4, and N2 levels in percent by volume from one or more surface or near surface geological samples; adding the water vapor content to the measured CO2, O2, CH4, and N2 levels in percent by volume; normalizing the gas mixture to 100% by volume or 1 atmospheric total pressure; and determining the ratios of: O2 versus CO2 to distinguish in-situ vadose zone CO2 from exogenous deep leakage CO2; CO2 versus N2 to distinguish whether CO2 is being removed from the near surface formation or CO2 is added from an exogenous deep leakage input; or CO2 versus N2/O2 to determine the degree of oxygen influx, consumption, or both; wherein the ratios are indicative of natural in situ CO2 or CO2 from the exogenous deep leakage input.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.