Patent · US Active

Process-based approach for the detection of deep gas invading the surface

US9645129B2 · kind B2 · utility

0Cited by
4References
20Claims
0Family size

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Key dates

Filing dateJun 27, 2014
Grant dateMay 9, 2017
Priority date
Expiry dateOct 20, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N33/24
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The present invention includes a method for determining the level of deep gas in a near surface formation that includes: measuring CO2, O2, CH4, and N2 levels in percent by volume from one or more surface or near surface geological samples; adding the water vapor content to the measured CO2, O2, CH4, and N2 levels in percent by volume; normalizing the gas mixture to 100% by volume or 1 atmospheric total pressure; and determining the ratios of: O2 versus CO2 to distinguish in-situ vadose zone CO2 from exogenous deep leakage CO2; CO2 versus N2 to distinguish whether CO2 is being removed from the near surface formation or CO2 is added from an exogenous deep leakage input; or CO2 versus N2/O2 to determine the degree of oxygen influx, consumption, or both; wherein the ratios are indicative of natural in situ CO2 or CO2 from the exogenous deep leakage input.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.