Magnetic device, vapor deposition device and vapor deposition method
US9650709B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 2014 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Sep 25, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure provides a magnetic device and a vapor deposition device. The magnetic device is configured to adsorb a metal mask in the vapor deposition device, including: a metal plate; an electromagnet array including a plurality of electromagnets; each of the electromagnets being inserted in the metal plate; a power supply module configured to supply a current; a control module configured to, when adsorbing the metal mask during a vapor deposition process, control the power supply module to supply a direct current to all or some of the plurality of electromagnets and control a direction and a size of the direct current by sending a first control signal to the power supply module.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.