Substrate incorporating a repair structure for rubbing cloth
US9651805B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Sep 26, 2014 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Sep 26, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133351
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a substrate, wherein a repair structure is arranged on the substrate and used for repairing surface fibers of rubbing cloth. According to the substrate provided by the present invention, by virtue of the repair structure on the substrate, the curvatures of the surface fibers of the rubbing cloth can be the same when the rubbing cloth passes through the repair structure, thus improving the arrangement orderliness of the surface fibers of the rubbing cloth, and then effectively alleviating the phenomenon of poor rubbing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.