Methods, systems, and computer program product for implementing DRC clean multi-patterning process nodes with parallel fills in electronic designs
US9652579B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2015 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Mar 31, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2119/18
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed are techniques for implementing parallel fills for electronic designs These techniques identify a shape and one or more neighboring shapes of the shape by searching design data of a region of a layout of an electronic design, classify the shape and the one or more neighboring shapes by examining respective characteristics of and to categorize the shape and the one or more neighboring shapes into one or more classes, implement one or more parallel fill shapes for at least one shape of the shape and the one or more neighboring shapes by aggregating the one or more parallel fill shapes to the at least one shape based in part or in whole upon the one or more classes while automatically satisfying one or more design rules, and perform one or more post-layout operations on the layout including the one or more parallel fill shapes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.