Method of manufacturing display device
US9653495B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 2015 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Jul 21, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/134372
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a display device includes: forming a gate electrode on a substrate; forming a gate insulating film on the substrate; forming an oxide semiconductor on the substrate; forming a source electrode and a drain electrode on the substrate; forming a passivation film on the substrate; forming a common electrode on the substrate; forming an interlayer insulating film on the substrate; forming a pixel electrode on the substrate; forming an alignment film on the substrate; radiating UV-rays onto the oxide semiconductor; and heat-treating the oxide semiconductor irradiated with the UV-rays. The radiating UV-rays is performed after the forming an oxide semiconductor, and the heat-treating is performed after the forming a passivation film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.