Patent · US Active

Stencil masks for making conformable electromagnetic device structures

US9656290B1 · kind B1 · utility

0Cited by
1References
17Claims
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Key dates

Filing dateJul 7, 2014
Grant dateMay 23, 2017
Priority date
Expiry dateSep 26, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D5/022
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A new 3D stencil mask guides deposition of a shaped structure, typically an electromagnetic device component, onto a non-planar surface. The 3D stencil mask includes islands and bridges from prior art two-dimensional lettering stencils, but raises the islands and stencils above the side of the 3D stencil mask facing a non-planar surface, forming undercuts, so that material particles, such as from vacuum metal deposition, will form connected shapes. The 3D stencil mask is also configures so that the dimensions of the resulting electromagnetic structures are altered from a simple projected image of a structure designed for a planar surface so that the electromagnetic properties of the deposited structure are more nearly the same as those of a corresponding structure on a planar surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.