Patent · US Active

System of exhuast and operation method thereof

US9657757B2 · kind B2 · utility

3Cited by

2References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Tung-Lin Yang · Hsinchu, TW
Chun-Hung Chang · Hsinchu, TW
Rouh Jier Wang · Hsinchu, TW

Key dates

Filing date	Mar 16, 2015
Grant date	May 23, 2017
Priority date	—
Expiry date	Nov 18, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67017
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Some embodiments of the present disclosure provide a method of dissipating process exhaust from a chamber. The method includes conveying the process exhaust from the chamber through an inner tube of a pipeline to abatement. The process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline. The method maintains an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline. The second temperature is negative offset from the first temperature within a predetermined value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.